抄録
An object mounting structure has been developed for use in millimeter-wave scanning near-field microscopy in order to efficiently reduce both unwanted signal fluctuations caused by surface waves within the object to be imaged and reflections from outside the object. The object mount comprises a hemispherical lens with an anti-reflection (AR) layer covering the spherical surface. An object mount for use at a millimeter-wave frequency of 60GHz has been designed and fabricated. Experiments performed at 60GHz show that signal fluctuations resulting from the above two factors can be dramatically reduced using this object mounting structure.
