IEICE Electronics Express
Online ISSN : 1349-2543
ISSN-L : 1349-2543
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Boron-doped amorphous carbon film grown by bias assisted pyrolysis chemical vapor deposition
Ishak AnnuarJalal RouhiMohamad Rusop
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2015 Volume 12 Issue 3 Pages 20140937

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Abstract

Boron-doped amorphous carbon (a-C:B) films were successfully synthesized via a bias-assisted pyrolysis-chemical vapor deposition (CVD). The effect of substrate bias on the thickness, surface morphology, electrical properties of a-C:B film were investigated. The AFM measurements and conductivity result show the surface roughness and resistivity of a-C:B films decreases with increasing substrate bias from 0 to −20 V. The fabricated films were evaluated for use in photovoltaic solar cells. The fabricated solar cell with the configuration of Au/p-C:B/n-Si/Au achieved conversion efficiency (η) of 1.431% at applied bias voltage of −20 V. This result showed the successful interstitial doping of boron in the amorphous carbon films deposited by this method.

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© 2015 by The Institute of Electronics, Information and Communication Engineers
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