抄録
The effective attenuation length (EAL) is a necessary parameter to estimate the thickness of SiO2 overlayer by X-ray photoemission spectroscopy (XPS). Inelastic mean free path (IMFP) is often used instead of EAL because EAL is scarcely known. EAL values were determined experimentally in the photon energy region from 480 eV to 800 eV using synchrotron radiation photoemission spectroscopy. EALs estimated are different from calculated IMFPs. Average values of theoretically-calculated IMFPs are close to the estimated EALs.
