電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
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SiCウェハ製造に関する最近の動向
藤本 辰雄
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ジャーナル フリー

2010 年 130 巻 6 号 p. 917-919

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Recent development and current status on the growth technology of silicon carbide (SiC) single crystals, long-known as a promising wide bandgap semiconductor material applicable to electronic devices of higher performance, are briefly described. The micropipe defect density, which is known to cause fatal problems in SiC devices, has been reduced significantly, and up to date no longer cited as the most harmful defect for device applications. In addition, such technological advance has led to the increase of the crystal diameters up to 100mm, evoking acceleration of SiC device productions.

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© 電気学会 2010
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