電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
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CVD作製したLiTaO3薄膜の特性
門田 道雄栃下 光
著者情報
キーワード: LiTaO3, CVD
ジャーナル フリー

2011 年 131 巻 6 号 p. 1188-1189

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抄録
LiTaO3 is a key material for surface acoustic wave (SAW) devices, bulk devises, piezoelectric elements, pyroelectric sensors and other applications. However, for almost of their applications the LiTaO3 single crystal is used. In this paper, authors report the growth of LiTaO3 films on a metal electrode layer by Chemical Vapor Deposition (CVD) by changing Li source condition. The characteristics of the LiTaO3 films observed by the X-ray diffraction (XRD) and their polarity dependent on the Li source supply volume. By controlling the Li/Ta ratio, high quality ferroelectric LiTaO3 films are deposited.
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© 電気学会 2011
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