2020 年 140 巻 4 号 p. 452-456
We report an improvement of the Plasma-on-Chip device that enables plasma irradiation to single cells. Dielectric barrier discharge (DBD) structure was introduced and power consumption was reduced to 200 µW. The modification extended the operation time of the Plasma-on-Chip device. As long as 10 min plasma irradiation to yeast cells, Saccharomyces cerevisiae was conducted.
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