Sputter Deposition of Pb[Zr,Ti]O₃ Thin Film onto Pre-Etched Substrate

抄録

This paper demonstrates successful deposition and etching of Pb[Zr,Ti]O₃ (PZT) thin films on pre-etched Si substrate with pits having depths of several hundred micrometers. Conventionally, for fabrication of microelectromechanical systems, PZT films are deposited onto a flat substrate because of inherent difficulties associated with stable deposition and processing. We successfully established the fabrication of PZT thin films and electrodes on non-flat and pre-etched substrate by using sputtering deposition and projection exposure techniques. The evaluation results reveal that the PZT thin film deposited onto the pre-etched substrate has good ferroelectric characteristics, including piezoelectric d₃₃ constant of 80 pm/V.