Liquid Immersion Angled Exposure for 3D Photolithography

抄録

Photolithography on a sample surface with vertical side walls is studied. In the angled exposure for patterning side walls and bottoms, the reflection of the exposing light causes superimposition of the pattern. The reflection should therefore be minimized to obtain a defect-free pattern. The liquid immersion method is applied. With polarization control, an optimum pattern is obtained using single shot exposure.