電気学会論文誌E(センサ・マイクロマシン部門誌)
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
特集研究開発レター
Deposition and Characterization of Al2O3 and BiFeO3 Thin Films on Titanium Substrates for Tough MEMS Devices
Takeshi KohnoMasato MiharaAtaru TanabeTakashi AbeMasanori OkuyamaMasayuki Sohgawa
著者情報
ジャーナル フリー

2017 年 137 巻 1 号 p. 46-47

詳細
抄録

Insulator and piezoelectric thin films were deposited on titanium substrate, and characterized for application in tough MEMS tactile sensors. The titanium substrate was polished by buffing before the deposition of the thin films. An Al2O3 thin film was deposited as an insulator and showed good insulation characteristics on the polished titanium substrate. Piezoelectric BiFeO3 thin films were prepared by RF sputtering. The XRD pattern of the BiFeO3 thin film on the titanium substrate shows the presence of the ferroelectric phase. The polarization-electric field curve also shows a ferroelectric hysteresis loop. The results show that insulator and piezoelectric thin film can be formed on titanium substrate.

著者関連情報
© 2017 by the Institute of Electrical Engineers of Japan
前の記事 次の記事
feedback
Top