結晶セレン薄膜を用いたマイクロ可視光センサのためのパターニング技術の開発

抄録

This paper reports a patterning process for photodiodes using crystalized selenium thin films which exhibit very high optical absorption coefficient with suitable spectral response at visible wavelengths. Selenium (Se) / titanium dioxide (TiO₂) heterojunction photodiode can be fabricated by sequentially thin film deposition processes at relative low process temperatures (< 350℃) and can be patterned by combination of lithography and etching processes. In this study, the impacts of tellurium inserted layer between Se and TiO₂ layers on their adhesion are experimentally investigated. Process damages on the patterned photodiodes are also characterized through current-voltage measurement.