電気学会論文誌E(センサ・マイクロマシン部門誌)
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
X-ray Mask with SiC Membrane for LIGA Process
Hiroshi UenoMakoto HosakaOsamu TabataSatoshi KonishiSusumu Sugiyama
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1999 年 119 巻 4 号 p. 229-235

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In order to develop a practical LIGA process, a high contrast X-ray mask with a SiC membrane was produced. The X-ray mask was composed of a 3μm thick Au as an absorber, a 2μm thick SiC as a membrane of dimensions 10mm × 30mm and a 2mm thick Si of dimensions 3 inch as a frame. A feature of the X-ray mask is the application of a SiC membrane, which has high permeability to X-rays, high thermal conductivity and moderate tensile stress. As a result, Ni microstructures with a maximum aspect ratio of 100, corresponding to 2μm width and 200μm height, were fabricated by the LIGA process.

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© The Institute of Electrical Engineers of Japan
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