抄録
Since the discovery of high Tc oxide superconductors, intensive studies have been made on forming thin films. Not only application for cryoelectronics but also physical study requires welldefined films with a smooth surface and the desired crystalline orientation. So far, several methods such as sputtering, vapor deposition, pulsed laser deposition and chemical vapor deposition have successfully been used to produce oxide superconductor films with epitaxial growth. Oxidation is a critical condition to obtain good quality films. In addition, peripheral technologies such as etching, electrode formation and protection coating are considered to be important for devices such as Josephson junctions, SQUIDs and infrared radiation detectors.
