2020 年 13 巻 p. E20-004-1-E20-004-3
We have been developing a three-dimensionally (3D) structured complementary metal-oxide semiconductor (CMOS) image sensor (CIS), which has individual signal processing circuits in each pixel under the photoelectronic conversion area for high-performance and multi-functional operation. In this paper, we report on our experimental 3D integrated circuits developed using multi-stack technology, which enables us to fabricate 3D-CISs with small pixels. The results showed the fundamental operation of the prototype circuit, which indicates the feasibility of highly integrated 3D-CIS of More-than-Moore type applications.