Transactions of The Japan Institute of Electronics Packaging
Online ISSN : 1884-8028
Print ISSN : 1883-3365
ISSN-L : 1883-3365
Short Note
Electrical Resistance of Cu-Cu Interconnection Using Electroless Ni(P) and Au Plating
Z. D. MaH. T. HungC. R. KaoY. H. Chen
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2020 年 13 巻 p. E20-013-1-E20-013-3

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The electrical resistance of interconnection fabricated by electroless Ni(P) and Au plating was measured by four-point probe measurement technique. Prior to the bonding, the average electrical resistance of electroplated copper pillars was 0.21 mΩ. After bonding with electroless Ni(P) plating, the average electrical resistance of joints was 8.4 mΩ and even decreased to 4.8 mΩ with 400°C post-aging process. As for bonding with electroless Au plating, two different kinds of surface finish processes were applied. The averaged electrical resistances of electroless nickel immersion gold (ENIG) joints and direct immersion gold (DIG) joints were 3.00 mΩ and 1.76 mΩ, respectively. In comparison with conventional SnAgCu solder joints (760 μm) (7.1 mΩ,), joints bonding with electroless plating has smaller electrical resistance.

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© 2020 The Japan Institute of Electronics Packaging
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