RFスパッタ法で作製したパラジウム薄膜中の水素の拡散係数
1989 年 53 巻 11 号 p. 1085-1088
詳細
1989 年 53 巻 11 号 p. 1085-1088
Diffusion coefficients of hydrogen in the palladium films of α-phase have been measured between 278 and 323 K by an electrochemical stripping method. Palladium films were deposited on iron by RF sputtering. The values of the diffusion coefficient of hydrogen obtained for the film specimens of 0.68 μm and 1.36 μm in thickness were about 2 orders of magnitude lower than those reported for the bulk specimens in the literature, and the temperature dependence of the diffusion coefficients of hydrogen was given by DH (m2/s)=4.16×10−9exp (−25.7 (kJ/mol)/RT).
