Laser patterning technique of multi-layer thin film structures was developed as a new fabrication process for the integrated-type amorphous silicon (a-Si) solar cells. It was found that the total output power for an a-Si solar cell submodule using the laser patterning method was 20% higher than that obtained by a conventional patterning method. In laser patterning, optical and three-dimensional thermal analysis of multi-layer structures was performed to determine the selective scribing conditions for each layer of an a-Si solar cell. It was found that each layer of the integrated-type a-Si solar cells can be selectively scribed by a Q-switched YAG laser.
