イオンビーム支援蒸着法により形成されたC-N系薄膜のトライボロジー特性に与える基板材料の効果
2002 年 68 巻 2 号 p. 279-283
詳細
2002 年 68 巻 2 号 p. 279-283
Carbon Nitride(C-N) films were formed on several engineering material substrates by ion-beam-assisted deposition(IBAD). Si(100) wafer, high-carbon chromium bearing steel(SUJ2), pure titanium(99.5 %), and aluminum alloy(A7075) were used as substrates. Nanoindentation hardness and tribological properties were investigated. The films on all substrates showed about 20 GPa of hardness and 200 GPa of elastic modules. There were no dependences on substrate materials in the synthesis of C-N films by IBAD technique. The friction coefficients were 0.2 irrespective of the substrate materials. Significant improvement of wear resistance was verified by forming C-N film on these substrate materials. Especially, the C-N film on titanium substrate showed excellent durability due to high adhesion strength. It could be concluded that the synthesis of C-N film by IBAD technique was a very effective surface modification method.
