抄録
Polycrystalline Fe3O4 films were deposited by ferrite plating, irradiating the substrate surface with an Xe-lamp (350 W) and using FeCl2 and NaNO2 as reaction solution and oxidizing solutions, respectively. When the concentration of FeCl2 is high the surface of the film is rough having grains 0.2∼0.4 μm in size. As the concentration of FeCl2 decreases the surface smoothness improves but the deposition rate of the film decreases. Adding dextran [(C6H10O5)n, n=1200∼1800] into the reaction solution improves the surface smoothness without decreasing the deposition rate much.
