日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
薄膜
レーザーアブレーション法によるNi-Zn-フェライト膜の形成
田中 邦生小俣 雄二西川 幸男吉田 善一中村 和夫
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ジャーナル オープンアクセス

1991 年 15 巻 2 号 p. 343-346

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Ni-Zn-ferrite thin films were formed on glass substrate by a laser ablation method which uses KrF excimer laser of 248 nm wavelength at 15 Hz frequency. The substrate temperatures examined were room temperature, 200°C and 350°C. Thickness of deposited film was 2μm. Ni-Zn-ferrite films are of a spine1 structure when the substrate temperature is increased up to 200°C. Saturation magnetic flux densities of Ni-Zn-ferrite films which annealed at 400°C were 1300∼2020 gauss. The coercive force of annealed Ni-Zn-ferrite films decreased from 534 to 70∼113 Oe with decreasing N2O gas pressure from 1×10-2 Torr to 1×10-5 Torr.
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© 1991 (社)日本応用磁気学会
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