抄録
The magneto-impedance (MI) effect was observed in a sputtered FeCoB thin film of 1.7 μm thickness, 1 mm length, and 10 μm width when a very sharp pulse current was applied to the film. A CMOS multivibrator was used to obtain a sharp pulse. The pulse width at half the magnitude of the pulse applied to the film was around 2.5 ns, voltage change ratios of - 1 mV/Oe and 120 mV/Oe were obtained in films annealed in transverse dc fields of 60-70 Oe and 100 Oe, respectively. The conditions for generation of the skin effect were analyzed with respect to the pulse shape, pulse frequency, and critical sinusoidal wave frequency.
