磁性薄膜
反応スパッタFe3O4膜の熱処理に伴う特性変化
1983 年 7 巻 2 号 p. 67-70
詳細
1983 年 7 巻 2 号 p. 67-70
The magnetic properties of sputtered iron oxide films have been studied. Fe3O4 films were directly formed by reactive sputtering of an Fe target in Ar-O2 atmosphere, and were annealed in a temperature range from 265 to 345°C.
Coercive force Hc of the films at low temperatures increased with increasing annealing temperature, though the decrease in coercivity was reported for powder specimens. The values of Hc and Mr/Ms, were also affected by crystallite orientation of the films. The relation between Hc and structure of the films was discussed.
