Journal of Surface Analysis
Online ISSN : 1347-8400
Print ISSN : 1341-1756
ISSN-L : 1341-1756
- Database -
The NIST Electron Effective-Attenuation-Length Database
C.J. PowellA. Jablonski
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ジャーナル フリー

2002 年 9 巻 3 号 p. 322-325

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抄録
The NIST Electron Effective-Attenuation-Length Database provides values of electron effective attenuation lengths (EALs) in solid elements and compounds at selected electron energies between 50 eV and 2, 000 eV. The database was designed mainly to provide EALs (to account for effects of elastic-electron scattering) for applications in surface analysis by Auger-electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). For these applications, EALs are needed mainly for measurements of the thicknesses of overlayer films and to a much lesser extent for measurements of the depths of thin marker layers. EALs are calculated using an algorithm based on electron transport theory for measurement conditions specified by the user. The database also provides values of other parameters needed for other quantitative applications of AES and XPS.
著者関連情報
© This paper is a U.S. Government work and is in the public domain in the United States.
Published in 2002 by the Surface Analysis Society of Japan.
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