ASMP : proceedings of Asian Symposium on Materials and Processing
Online ISSN : 2424-2853
セッションID: B-10
会議情報
B-10 Fabrication of Textured (Bi,Pb)_2Sr_2Ca_2Cu_3O_<10+X>/Ag Thick Films by Electrophoretic Deposition Method(Session: Thin films)
M.A.C. SottoR.V. Rivera-VirtudazoR.V. Sarmago
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抄録
Pure and Pb-doped (Pb=0.3) Bi_2Sr_2Ca_2Cu_3O_<10+x> (Bi-2223) thick films (〜5-30 μm) were electrophoretically deposited on high purity silver foil using ethanol as the suspending liquid. The deposition was done at applied voltage of 400 V/cm and current of 〜0.02 mA/cm^2 for a period of 10 minutes. Short sintering time of 1 hour at 820℃ was performed to reduce film porosity and allow vacancy diffusion of the deposited grains. X-ray diffraction and surface image analysis of the film shows c-axis orientation and excellent grain alignment, respectively. These results indicate texturing of the deposited films.
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© 2006 一般社団法人 日本機械学会
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