抄録
Ceramic films are needed in micro-electro-mechanical systems as insulating, piezoelectric and ferroelectric materials. The required film thickness is 1-10μm. This is too thin to machine by polishing or grinding, and too thick to grow by chemical or physical vapor deposition. The present study proposes a new method called powder jet deposition (PJD) for fabricating ceramic films 1-10μm in thickness. Indentation and scratching tests are performed on ceramic films deposited by the PJD method. It is found that the hardness of the films depends on PJD conditions.
