抄録
A strong need exists for a fine three-dimensional metal patterning technique, which is used for the next generation devices, such as patterned media, plasmon photonic and nano-scale electrode. We have developed a technique for transferring three-dimensional metal patterns onto a poly(ethylene terephthalate) substrate by nanoimprint lithography using a metal oxide release layer. A three-dimensional nanoimprint mold was fabricated by control of acceleration voltage electron beam lithography (CAV-EBL). As a result, three-dimensional metal patterns were obtained with metal oxide release layer.
