Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
2009
Session ID : P-MCH-02
Conference information
P-MCH-02 Fabrication of High Aspect Ratio Micro-Structures Using Supercritical Drying Technology(Micro/Nanomechatronics,Technical Program of Poster Session)
Norifumi OotaniFumikazu OohiraTakaaki SuzukiSatoru Kadoriku
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Abstract
In this study, we fabricated high the micro-structures of aspect ratio made of silicon or thick photoresist SU-8 using the supercritical drying technology. Form the result of silicon micro-structure fabrication, it was confirmed that the micro-structures having the high aspect ratio of 1000 can be fabricated without sticking. Further, from hand the result of SU-8 micro-structure fabrication, it was confirmed that the residual of SU-8 in the channel was flowed to the openings due to the effect of supercritical drying.
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© 2009 The Japan Society of Mechanical Engineers
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