抄録
B-C-N films were prepared on single silicon substrates by rf magnetron sputtering using a composite target of diamond and cBN powder. The target was mounted on a rf magnetron cathode,then sputtered by nitrogen and hydrogen gases.The hardness of the B-C-N film increases with increasing hydrogen flow rate,corresponding to a maximum at 10 cm^3/min,followed by a drop above 30cm^3/min. The film was stable for a long time when it was deposited at the substrate temperature of 500℃ .Furthermore that the B-C-N film didn't show the significant weight change under the.heat treatment test at 500℃ in the air,whereas the DLC films were disappeared after the test.These results suggest that the B-C-N film has the potential to be applied to the tribological coatings under relatively high temperature conditions.
