表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:ウエットプロセスの新展開
陽極酸化技術の液晶ディスプレイへの応用
水谷 文一宇恵 誠
著者情報
ジャーナル フリー

2001 年 22 巻 6 号 p. 376-381

詳細
抄録

Anodization technology used in LCDs (Liquid Crystal Displays) is reviewed. The wet anodization process has an advantage over other dry processes to produce thin oxide films with very smooth surface and less pinholes. Aluminum or its alloy gate lines used in some TFT (Thin Film Transistor)-LCDs are covered with anodic oxide thin films to prevent their hillock formation and corrosion. On the other hand, anodic oxide films of tantalum or its alloys are also used as an insulator of non-linear switching elements in TFD (Thin Film Diode)-LCDs. Anodization is carried out in aqueous or nonaqueous electrolyte solutions. However, only limited electrolyte solutions have been used for manufacturing TFT-LCDs. Here, we introduce our recent results on the anodization of sputtered Al-Nd alloy films in ethylene glycol - based nonaqueous electrolyte solutions.

著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top