特集：実用表面分析の最前線
クラスターイオンの使い道 （SIMS & XPS）
2016 年 37 巻 4 号 p. 178-183
詳細
2016 年 37 巻 4 号 p. 178-183
Secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS) have been used for the analysis of inorganic and organic materials. Recently, cluster ion beams have been utilized for the etching of organic materials for depth profiling in SIMS and XPS, and ionization in SIMS. In this paper, recent studies on different types of cluster ions for SIMS and XPS will be reviewed and summarized.
