抄録
Sputtering-based metal ion sources were reviewed in comparison with ion sources based on arc discharges. This metal ion source has advantages of few generation of metal droplets which disturbs material processing on treated surfaces, but a problem of a low extracted ion current. However, various techniques were reported to enhance the metal ion current. Furthermore, this paper also explained merits on usage of metal ions for materials processing compared with that of metallic neutrals, together with some applications on formation of thin films with metal ions for manufacturing of ULSI semiconductor devices and surface modification of polymer films.
