Leading Edge Short Wavelength Light Source (DUV/EUV for High Volume Semiconductor Manufacturing)

Abstract

Recent semiconductor volume manufacturing is supported by DUV (KrF/ArF) light source. and next generation will be supported by EUV lightsource. I will discuss about DUV progress and its appriction to nano direct processing. We have demonstrated actual collector mirror reflectivity degradation rate is less than 0.4%/Gp by using real collector mirror around 125W (at I/F clean) in burst power during 30 Billion pulses operation. Recently we have redefined target power higher >330W and its development plan.