交流電弧真空蒸着法と蒸着金属薄膜の構造

抄録

A method for vacuum-arc evaporation has been developed. This uses arcs in a vacuum bet-ween two electrodes made of the evaporant and supplied with an alternating voltage of 10_??_50 volts, and can easily be applied to evaporate all kinds of conductive materials. For the purpose of structural study of thin films of highly-refractory metals, an apparatus was constructed in which the evaporation rate reaches as high as 10³Å per sec. and substrates can be heated up to 1600°C. Detaild description of the apparatus is given. Studies by the use of electron microscopy and ele-ctron diffraction are also described, especially in the cases of depositing molybdenum and tungsten on cleavage surfaces of rock salt, on carbon films and on cleavage surfaces of graphite at various temperatures. Carbide formation was found to occur as a result of a direct reaction of the depo-sited metals with carbon in the, case of carbon and graphite substrates