抄録
We have tried to create nanopatterns by Ar ion ′transcription′ method which was invented by B.-S. Xu and S.-I. Tanaka in 1996. This method is based on the sputtering of Ar ion tracing designed patterns and it enables to fabricate three dimensional nanostructures by transferring materials to substrate from the inner walls of a target followed by a heat treatment. As a first step, dotted nanoparticles were formed by Ar ion irradiation using holes pierced through Cu target. Nanoparticles made of Cu, Cu2O or CuO are formed in crystalline or amorphous state. The morphology and dimension of the nanoparticles could be controlled by changing Ar ion beam irradiation time. Nanoparticles having polyhedron shape as small as 10nm were obtained within 120sec, whereas they grew into sphere upto about 500nm in diameter when the time was over than 600sec.
