抄録
Micropatterning of zinc oxide thin film was realized using site-selective deposition which involved molecular recognition at the inorganic-organic interface. A SAM which has a pattern of both silanol and alkyl surfaces was immersed in an aqueous solution containing Zn precursor. Zn(OH)2 was deposited and a thin film was grown on the silanol surface selectively. A Zn(OH)2 thin film fabricated by site-selective deposition had no cracks and the feature edge acuity of its micropattern was much higher than that of the micropattern obtained by a lift-off process. ZnO thin film was obtained by annealing Zn(OH)2 thin film at 400oC. Photoluminescence in the UV region was observed from ZnO thin film excited with 350 nm light.
