Effect of sintering and annealing temperatures on the transparency of SiO2 glass by spark plasma sintering

抄録

A transparent SiO₂ body was prepared by spark plasma sintering (SPS), and the effects of sintering and annealing temperature on the transmittance of the SiO₂ body were investigated. The SiO₂ bodies sintered at 1073 to 1673 K were in amorphous state. The relative density of the SiO₂ body was 98% at 1373 K and reached 100% at 1573 K. The transmittance of the SiO₂ body sintered at 1573 K had the maximum values, i.e., 91% at a wavelength of 5000 cm^-1, 98% of the theoretical transmittance. In the ultraviolet range, the transmittance of the SiO₂ body sintered at 1573 K was about 40% at 200 nm. After annealing at 1073 K for 1 h, the transmittance in the UV range was increased to 75% at 200 nm, 82% of the theoretical transmittance.