Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter

Shigeru Kurosawa; Hideyuki Miura; Mitsuhiro Tozuka; Shoichiro Yamahira; Hidenobu Aizawa; Kongkiat Kongswan; Mutsuo Matsunaga; Kazunori Yamada; Mitsuo Hirata

doi:10.2494/photopolymer.16.43

Shigeru Kurosawa, Hideyuki Miura, Mitsuhiro Tozuka, Shoichiro Yamahira, Hidenobu Aizawa, Kongkiat Kongswan, Mutsuo Matsunaga, Kazunori Yamada, Mitsuo Hirata

著者情報

キーワード: plasma polymerization, continuous wave (CW), pulse wave (Pulse), quartz crystal microbalance (QCM), film resistance

ジャーナルフリー

2003 年 16 巻 1 号 p. 43-48

DOI https://doi.org/10.2494/photopolymer.16.43

詳細

抄録

We developed conventional measurement method of film resistance of plasma-polymerized (pp-) films from styrene and allylalcohol as a monomer coated with stainless plates using a high-resistance meter. This determination method is estimated for the film resistance range from 10⁵ to 10¹² Ω/cm. We found correlation between film thickness from 150 to 500 nm and the resistance value of 10⁵ to 10¹² Ω /cm for pp-allylalcohol film.

責任著者(Corresponding author)

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