2006 Volume 19 Issue 3 Pages 397-402
We developed the organic-inorganic hybrid material for UV-nanoimprint lithography (UV-NIL). Silicasol particles were used as inorganic component and modified their surface with photofunctional crosslinkers. These photofunctional silicasol particles were dispersed uniformly into photofunctional monomers with non-solvent systems. They were mixed with other monomers and photoinitiator to prepare various imprint materials. Physical properties and mechanical properties of these materials were examined. The UV-NIL patterns were obtained by using an imprint test machine "LTNIP-5000" from Litho Tech Japan Co. The results showed greatly improved UV hardening properties and physical properties such as refractivity, thermal stability compared to organic (non-hybrid) materials. As a result, 200 nm line and space patterns were successfully imprinted with no shrinkage at pressure of 3.1 MPa and exposure doses of 1 J/cm2.
