High Resolution X-ray Lithography: Features of Two-dimensional Patterning
1997 年 10 巻 4 号 p. 619-623
詳細
1997 年 10 巻 4 号 p. 619-623
We studied the x-ray image formation of sub-100nm two-dimensional structures. Numerical simulation and physical modeling were used to correlate with the x-ray lithography replication results obtained by using synchrotron radiation and a commercial stepper worked at mask-sample gaps of 10μm and below.
