Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Synthesis of a Novel Polymer with Acid Amplifier Unit in the Side Chain and Application for Photoresist Materials
Sang-Wook Park, Koji Arimitsu, Sungeun Lee, Kunihiro Ichimura
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Keywords: acid amplifier, acid proliferation reaction, chemically amplified photoresist, acid-catalyzed deprotection, photoacid-generator, photosensitivity, photoimaging
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2000 Volume 13 Issue 2 Pages 217-220

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© The Technical Association of Photopolymers, Japan
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