BIO-MICROLITHOGRAPHY

UV-AND E-BEAM PATTERNING OF BIOACTIVE MOLECULES

抄録

UV- and e-beam lithography employing Diazo-Naphtho-Quinone/novolak and poly(tert-Buthyl-Methacrylate)-co-(MethylMethacrylate) respectively as radiation sensitive systems were used to pattern bioactive molecules. Positive and negative tone DNQ based lithography succeed in printing fluorescent avidin up to 2μm resolution, through the linkage of the amino-end of the protein to the photoinduced inden carboxylic acid, either via in-situ addition to ketene, or via NH₂-to-COOH crosslinking mediated by carbodiimide. The carboxylic group produced during e-beam patterning was used as an anchoring site for the same protein. Both UV and e-beam lithography were used for bottom-to-top molecular architecture construction, rather than top-to-bottom classical expose-develop technological sequence. It was found that UV and e-beam lithography materials and techniques can be easily transferred in bio-microlithography, with impact on biodevices fabrication and combinatorial chemistry.