Atomic Force Microscope Lithography on Pulsed Plasma Polymerized Films

抄録

Pulsed plasma polymerization of styrene was performed in a plug flow reactor which was discharged by a capacitively coupled electrode system and a pulsed RF generator. The polystylene film was evaluated as an electron-beam resist, which showed a good sensitivity of about 60μC/cm². The resist was also patterned by an atomic force microscope (AFM) with Au coated cantilever and the scanned area of 10×10μm² was developed successfully in a mixture of hexane and ethanol.