抄録
Electrostatic imprinting is a relatively novel process for large-area and high-efficiency patterning of glasses at a low temperature with a low pressure. In this process, the proper choice of a mold mamterial is an issue that need to be more studied for the expansion of applicable fields of this technology in industry. Mold material for electrostatic imprinting must have electrical conductivity, adequate adhesion property with glasses, and excellent thermal and electrochemical stability because high dc voltage bias is applied to a mold and glass at high temperature. In this study, thin Pt/Ni molds were fabricated by Si micromachining and electroforming techniques. Using fabricated Pt mold samples, electrostatic imprint tests were performed to evaluate its feasibility as a mold.
