Efficient Fabrication Process for Metallic Nanograting Combining Nanomachining and Cold Welding

抄録

This paper presents a new methodology for fabrication of Au nanograting pattern. Evanescent field enhancement based on nanograting is well studied for enhancing sensitivity of surface plasmonic detection. However, the practical application of this method suffered from high fabrication cost and low throughput. To solve this problem, a process combining nanomachining and Au cold welding was proposed in this work. Ultraprecision cutting was conducted to fabricate a parallel groove pattern on a mother mold substrate. The mother mold structure was replicated to a Poly (methyl methacrylate) stamp by die casting. And the stamp was utilized to transfer Au nanograting on an Au film deposited on a quartz based on Au cold welding adhering and surface energy difference between substrate and stamp. The feasibility of the proposed fabrication process was verified. Furthermore, the influences of film thickness and welding load on transferring ratio and structural uniformity were evaluated.