2008 年 59 巻 2 号 p. 138
Using TOF-SIMS, we found that the NiO2/NiSO/NiS multi-layers are formed at the surface of an FeNi plated film in nanometer scale by adding sodium saccharin into the plating bath, and that these multi-layers reduce oxygen inclusion into the plated film while plating, preventing natural oxidation of the surface of the film. Also, using AES, we found the presence of a Ni rich layer just under the NiO2/NiSO/NiS multi-layers. Next, we plated an FeNi film in a plating bath without sodium saccharin onto an FeNi film which had been previously plated in another plating bath with sodium saccharin, and found that NiS which had existed at the surface of the lower film moved to the surface of the upper film. We also found that the surface structure of these double films is the same as that of a single FeNi film plated in a bath with sodium saccharin, when the upper film is thin enough.