抄録
An examination was made of the influence of some deposition parameters on coating structures and properties. The Sn films deposited on steel substrates were prepared using a do ion plating apparatus. The deposition parameters are distance between substrate and evaporation source, substrate temperature, deposition time, negative bias voltage, and argon pressure for glow discharge. Film thickness measurement was made by optical microscopy. The structures and surface morphology of the films were examined by scanning electron microscopy and X-ray diffraction. The corrosion resistance of the films was evaluated by salt spray testing. The adhesion of the films was estimated by the force required to strip the film off the substrate. From these results, the film thicknesses decreased with increasing distance between substrate and evaporation source, and also decreased with an increase in argon pressure for glow discharge. Inversely, the film thicknesses increased with increasing substrate temperature, deposition time, and negative bias voltage. An X-ray diffraction study indicated the presence of alloy layer for substrate temperatures above 150°C. The corrosion resistance of the ion-plated Sn films was also affected significantly by the plating conditions. Ion-plated films showed excellent adherence as compared with the films obtained by conventional vacuum deposition method.
