1990 年 41 巻 1 号 p. 45-48
The processes of initial deposition and film growth of crystalline Ni-Mo-P alloy films by electroless plating were investigated by transmission electron microscopy (TEM) in comparison with those of crystalline Ni-P alloy films by electroless plating. In case of the Ni-P alloy films, very fine grains are packed and grown, so closely that the grain structure is relatively uniform. Whereas in case of the Ni-Mo-P alloy films, nucleation occurs on Pd catalyst particles and the very fine grainy layer grows to a thickness of 300Å. At thicknesses greater than 300Å, the growth of nuclei occurs so preferentially that grain size increases. It is suggested that this film growth in the region of its thickness greater than 300Å is related to the nonuniform conditions in the crystalline state.