ミストCVD法による Cu₂SnS₃ 薄膜作製の試み

抄録

The mist CVD method is a low cost thin film deposition process in a non-vacuum. Cu₂SnS₃ thin films were fabricated by mist CVD method and the thin films were analyzed by XRD, EPMA, SEM and transmittance and reflectance measurement. From the XRD result the deposited film contained (111) of monoclinic Cu₂SnS₃ and (101) of SnO₂.