企画趣旨
連載講座「化学気相成長法および原子層堆積法の基礎と化学物質の安全管理」企画趣旨
2026 年 69 巻 3 号 p. 165
詳細
2026 年 69 巻 3 号 p. 165
Professor Atsushi Sekiguchi, author of this lecture series, worked at Canon Anelva Corporation from 1982 to 2016, where he was involved in the development of chemical vapor deposition (CVD) method. He has also contributed to the educational activities related to vacuum science and technology and thin film as a member of the Education Committee of the Japan Society of Vacuum and Surface Science (JVSS). This lecture series, “Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances”, introduces key points from the extensive teaching materials he developed over many years of educational work.
