はじめに
化学気相成長法および原子層堆積法の基礎と化学物質の安全管理 講座執筆にあたって
2026 年 69 巻 3 号 p. 166-167
詳細
2026 年 69 巻 3 号 p. 166-167
“Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) equipment” are reaction vessels that utilize chemical reactions. A thorough understanding of chemical reaction kinetics is essential when designing these processes and equipment. These articles will focus on the basics of chemical reaction kinetics, which are essential for the film fabrication process, and introduce actual application examples.
In addition, CVD and ALD handle a variety of chemical substances. This article will explain the hazards and safety design basics that must be considered when handling these chemical substances.
Thus far, thin-film fabrication and processing technologies using vacuum processes have proposed and realized a variety of semiconductor functional devices, making our dreams come true. In the future, there will undoubtedly be even more new semiconductor functional devices made possible by vacuum processes.
Vacuum vessels are truly a treasure trove for industry. We hope that this feature will inspire you to make your dreams come true.
