PtSiを用いたせり上げサリサイドの選択エッチングプロセスとHf混晶化による仕事関数変調

抄録

The selective etching process for elevated self-aligned silicide (salicide) utilizing PtSi has been investigated. We have developed novel selective etching process utilizing a diluted aqua regia followed by a diluted HF light etching. It was found that the residual Pt-rich silicide layers on the sidewall have been successfully removed. We have also investigated a work function modulation of PtSi alloying with Hf. The barrier height for electron of PtSi has been reduced approximately 0.1 eV for Pt_xHf_1-xSi formed by the silicidation of Pt(17 nm)/Hf(4 nm)/Si(100) stacked layer structures.